3 accepted papers
In semiconductor manufacturing, lithography machines are becoming more and more sophisticated system of systems. As an example, a TWINSCAN wafer scanner machine is composed of a wafer, and reticle handlers, reticle, optics, and two wafer chains or systems. In previous studies, we covered the interac…
Stretching the definition of the standard Sine profile allows building a generalized symmetric frequency-aware basis function that can be used to generate reference motion trajectories. Other profiles such as polynomials, sigmoid, and harmonic-based models can be equally used under the proposed tech…
Adopting the ideal reliable machine model, the throughput of a lithography machine can be given as the reciprocal of the operation time. This time can be defined at the die level where the actual exposure process takes place as the time unit per die. A closer look at the motion profiles, namely step…