3 accepted papers
In semiconductor manufacturing, lithography projects circuit layouts onto silicon wafers through an optical mask. As circuit features shrink below the wavelength of light, optical diffraction causes the printed patterns to deviate from their intended layouts. Inverse Lithography Technology (ILT) add…
We study the challenge of achieving theoretically grounded feature recovery using Sparse Autoencoders (SAEs) for the interpretation of Large Language Models. Existing SAE training algorithms often lack rigorous mathematical guarantees and suffer from practical limitations such as hyperparameter sen…
Interpretable reinforcement learning policies are essential for high-stakes decision-making, yet optimizing decision tree policies in Markov Decision Processes (MDPs) remains challenging. We propose SPOT, a novel method for computing decision tree policies, which formulates the optimization problem…