Solayman Hossain Emon

Large Pre-Trained Models and Few-Shot Fine-Tuning for Virtual Metrology: A Framework for Uncertainty-Driven Adaptive Process Control in Semiconductor Manufacturing (I)

High-precision wafer metrology poses significant cost and throughput challenges in modern semiconductor manufacturing, where frequent process changes and recipe variations demand highly adaptive and scalable solutions. In this paper, we present a Generative-FewShot-Active Virtual Metrology (GFA-VM) …